Nano material researching thin film coating vacuum furnaces instrument of laboratory
Application of vacuum furnaces
PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 3" diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal Gas Distribution. The platen can be biased with RF or Pulsed DC and it is heated resistively or cooled with chilled water circulation. The chamber is evacuated to low10-7Â torr pressure using 250 l/sec turbomolecular pump backed with 3.5 cfm mechanical pump. Standard unit comes with one inert gas, three reactive gas lines and four mass flow controllers. The planar Hollow Cathode Plasma source with its unique gas distribution system makes it possible to meet wide range of requirements such as plasma density, uniformity and separate activation of reactive species to cover the broadest possible deposition parameters
Featrues of vacuum furnaces
1.Stainless steel RF power and Aluminum chamber furnace
2.Vacuum 10-7torr range base pressure
3.RF shower head, Mircowave plasma sources
4.RF biased substrate houlder
5.Water cooled system
6.Heated platern up to 800 degree
7.Pneumatically controlled valves
8.PC controlled with lab view
9.Up to 4 MFC'S with vented box and gas manifolds
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Technical parmaters of vacuum furnaces
| Plit Tube furnace | Input power: 208 - 240V AC, 1.2kW 1200°C Max. working temperature for < 60 minutes 1100°C Max for continuous heating High purity quartz tube 2"OD x 1.7"ID x  39.4" Length 30 segments programmable precision digital temperature controller 8" (200mm), single zone. 2.3" (60mm)  (+/-1°C) @ 1000°C |
| Plasma RF Generator | Output Power:5 -300W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability  Reflection Power: 200W max. Matching:                 Automatic RF Output Port:        50 Ω, N-type, female Noise:                      <50 dB. Cooling:                    Air cooling. Power :                     208-240VAC, 50/60Hz |
| Vacuum Flange and Fittings | Vacuum flange set is made of stainless steel 304. Left flange assembly includes a KF-25 vacuum port,  two KF-25 quick clamp, A KF-25 right angle valve, a KF-25 vacuum bellows, a flange Support 1/4 O.D Hose fitting, and a needle valve. Right flange assembly includes a digital pirani gauge, 1/4 O.D tube fitting, 1/4" Feedthrough and a needle valve. |
| Vacuum Pump | AC 220V 50 Hz  1/2HP  375W 2 Liter /S  or 120 liter/m Oil trap (inlet) and exhaust filter (outlet) are installed. Max. vacuum:  10-2 torr |
| Warranty | 12 month (exclusive wearing part) |
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Pictures of Lab Touch screen vacuum CVD sintering furnace
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Payment
T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC
Warranty
Main product is 15 month, except wearing parts.
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Factory show
Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design,
manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.
Â
Show room
Contact Information:
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Nano material researching thin film coating vacuum furnaces instrument of laboratory
Application of vacuum furnaces
PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 3" diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal Gas Distribution. The platen can be biased with RF or Pulsed DC and it is heated resistively or cooled with chilled water circulation. The chamber is evacuated to low10-7Â torr pressure using 250 l/sec turbomolecular pump backed with 3.5 cfm mechanical pump. Standard unit comes with one inert gas, three reactive gas lines and four mass flow controllers. The planar Hollow Cathode Plasma source with its unique gas distribution system makes it possible to meet wide range of requirements such as plasma density, uniformity and separate activation of reactive species to cover the broadest possible deposition parameters
Featrues of vacuum furnaces
1.Stainless steel RF power and Aluminum chamber furnace
2.Vacuum 10-7torr range base pressure
3.RF shower head, Mircowave plasma sources
4.RF biased substrate houlder
5.Water cooled system
6.Heated platern up to 800 degree
7.Pneumatically controlled valves
8.PC controlled with lab view
9.Up to 4 MFC'S with vented box and gas manifolds
Â
Technical parmaters of vacuum furnaces
| Plit Tube furnace | Input power: 208 - 240V AC, 1.2kW 1200°C Max. working temperature for < 60 minutes 1100°C Max for continuous heating High purity quartz tube 2"OD x 1.7"ID x  39.4" Length 30 segments programmable precision digital temperature controller 8" (200mm), single zone. 2.3" (60mm)  (+/-1°C) @ 1000°C |
| Plasma RF Generator | Output Power:5 -300W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability  Reflection Power: 200W max. Matching:                 Automatic RF Output Port:        50 Ω, N-type, female Noise:                      <50 dB. Cooling:                    Air cooling. Power :                     208-240VAC, 50/60Hz |
| Vacuum Flange and Fittings | Vacuum flange set is made of stainless steel 304. Left flange assembly includes a KF-25 vacuum port,  two KF-25 quick clamp, A KF-25 right angle valve, a KF-25 vacuum bellows, a flange Support 1/4 O.D Hose fitting, and a needle valve. Right flange assembly includes a digital pirani gauge, 1/4 O.D tube fitting, 1/4" Feedthrough and a needle valve. |
| Vacuum Pump | AC 220V 50 Hz  1/2HP  375W 2 Liter /S  or 120 liter/m Oil trap (inlet) and exhaust filter (outlet) are installed. Max. vacuum:  10-2 torr |
| Warranty | 12 month (exclusive wearing part) |
Â
Pictures of Lab Touch screen vacuum CVD sintering furnace
Â
Payment
T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC
Warranty
Main product is 15 month, except wearing parts.
Â
Factory show
Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design,
manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.
Â
Show room
Contact Information:
Â
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